Sequential Sputtering System SC3000

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The SC3000 Large Sample, High Resolution Sequential Sputter System

The SC3000 Sputtering Coater System can coat complete 12 inch (300mm) wafers. Three sequential coatings can be achieved without breaking vacuum, offering multi- target sputtering.

This high vacuum, high resolution coating system gives fine and precise, reproducible coatings.

There are three Magnetron target assemblies in the SC3000, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profile targets.

The target system is particularly useful in the semi-conductor wafer industry. It has a turbomolecular pump backed by a Rotary Vacuum Pump.

The integrated instrument panel and plug-in electronics, maximise 'up-time' and, with user friendly designs, ensures satisfactory multi-user discipline.

The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.

The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.

A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.

Features:

Modular control electronics
Clean line design
Rotating Specimen Stage
Multi- Target Sputtering (With Sputter Cleaning Shutter Assembly)
LCD Status/Data Entry Display
Customer menu input allows up to 10 stored protocols
LCD Conditions Display (Vacuum, Time and Current)
Active Vacuum Gauge Head (giving full Vacuum operating range)
Turbo Molecular Drag Pump with full ISO 100 Flange, (larger pump option) 240 L/sec
Fast Cycle time fully automatic including purging - 15 minutes
Peltier Cooled Targets - no water requirements
Three sequential coatings without breaking vacuum.

Specifications of the SC3000 Sputtering System:

Instrument Case - 450mm W x 500mm D x 300mm H (Overall height of unit 650mm)
Work Chamber - Stainless Steel 300mm Dia. x 200mm H (With viewing Window)
Weight - 55Kg
Targets - Three x 57mm Dia. x 0.3mm Thick Chromium as Standard (optional range of targets available eg Gold, Platinum, Gold/Palladium)
Rotating Specimen Stage - Adjustable for 6 to 12 inch Wafers, Height spacing to target 60mm
Vacuum Gauge - Atmos. - 1 x 10^-5 mbar
Deposition - 0-750mA
Deposition Rate - 0-10 nm/minute
Sputter Timer - 0-4 minutes
Supply - 230 Volts 50Hz (10 Amp max. including pump)
115 Volts 60Hz (20 Amp max. including pump)
Services - Argon - Nominal 10 psi
Nitrogen - Nominal 10 psi (Argon may be used as common gas)
Rotary Backing Pump- Two Stage Vacuum Pump No5, 85L/Min complete with Vacuum Hose and Oil Mist Filter. 8m3/Hr.