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The K575X Peltier Cooled High Resolution Sputter Coater

The K575X uses a 'Turbo' pump, backed by a Rotary Vacuum pump, the complete pumping sequence being under automatic control.

K575X Sputter Coater | Image Pop UpThe vacuum can be adjusted to suit conditions for Chromium or other oxidising metals, as well as Gold targets, and has a Timer to allow for a range of sputtering times.

The Systems employs a Magnetron Target assembly, fitted with a 54mm Dia. quick change target.

The sputter head is Peltier Cooled to give high performance, fine grain coatings (no water requirements needed)

The Sputtering parameters can be pre-set including gas bleed needle valve, which has electromagnetic valve back up.

The K575XD (Dual Head), version of the above has two sputter heads. These are arranged such that for special coating applications, two sequential layers of a target material can be deposited without breaking the vacuum seal in this automatic unit.

Note: Whilst the overall specification is the same as the K575X, the K575XD has two heads. The K575X has peltier cooling for very thick depositions normally associated with the K575XD (Dual) unit it may be necessary to supplement with water cooling as required.

Features:

  • Fully automatic control
  • Peltier cooled sputter head
  • Fine coating (order of 0.5nm Cr Grain Size)
  • Special Rotating Stage with Full Tilt Facility fitted as standard
  • Thin Film Deposition (typically 5nm)
  • 165mm Diameter Chamber
  • Dual Sputter Head available as an option
  • Can be integrated with Film Thickness Monitor

Benefits:

  • Allows sputtering of fine grain oxidising metals such as Cr or Ir
  • Easy to operate
  • No cooling water required
  • Ultra high resolution reproducible coatings
  • Fully adaptable to a wide range of specimens
  • Repeatable film thickness depositions
  • Easy loading and unloading of samples
  • Allows sequential coatings to be made without breaking vacuum
  • Can pre-set deposition thickness

Specifications of the K575X Sputter Coater:

Instrument Case - 450mm W x 350mm D x 175mm H
Work Chamber - Borosilicate Glass 165mm Dia x 125mm H
Safety Shield - Polycarbonate
Plus Base - 110mm Dia x 115mm H
Weight - 42Kg
Target - 57mm Dia x 0.2mm Thick Chromium fitted as standard
Specimen Stage - 60mm Dia Rotate Stage with Tilt Facility
Vacuum Gauge Range - Atmosphere to 1 x 10-5 mbar
Operating Vacuum - 1 x 10-3 mbar to 1 x 10-4 mbar
Deposition Current - 0-150mA
Deposition Rate - 0-20nm/Minute
Sputter Timer - 0-4 minutes
Turbomolecular Pump - 60 litres/Second (Ultimate vacuum 1x10-8 mbar)
Services - Argon - Nominal 10 psi
Nitrogen- Nominal 10 psi (Argon may be used as common gas)
Vacuum Pump - Pump No 2. complete with Vac. Hose & Oil Mist Filter 35L/Min 2m3/Hr
Electrical Supply - 230 Volts 50Hz (6 Amp max. including Pump)
115 Volts 60Hz (12 Amp max. including Pump)